These facilities remove high-risk gases such as PFC, NOx, H2, and NH3.
Facility introduction
This system utilizes catalysts developed and produced by PureSphere to remove toxic gases, boasting high removal efficiency and safety. It is widely used in processes such as semiconductor and display manufacturing.
This facility is designed to remove high-concentration hydrogen and volatile organic compounds. By incorporating PureSphere's unique catalyst technology, it safely eliminates high-concentration hydrogen, making it suitable for pharmaceutical manufacturing processes.
This portable scrubber is easy to operate and can be moved conveniently to industrial or disaster sites. It ensures the safety of workers in areas where hazardous gases may be generated. Depending on the type of hazardous gas, immediate response is possible by simply replacing adsorbent cartridges. PureSphere produces its own adsorbents, and provides customized equipment depending on site conditions.